Heat load problems in deep X-ray lithography

Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Volumn 467-468, Issue PART II, 2001, Pages 1265-1268

  Cudin, I ^b   De Bona, F ^b   Gambitta, A ^a   Perennes F ^a   Turchet, A ^a  

^a SINCROTRONE TRIESTE   (Italy)

^b UNIVERSITY OF UDINE   (Italy)

Author keywords

Deep x ray lithography; FEM; Thermoelasticity; Transient analysis; X ray mask

Indexed keywords

ERRORS; FINITE ELEMENT METHOD; MASKS; THERMAL EXPANSION; THERMOELASTICITY; TRANSIENT ANALYSIS; X RAYS;

ABSOLUTE POSITION; DEEP X-RAY LITHOGRAPHY; MAXIMUM DISPLACEMENT; MECHANICAL CONSTRAINTS; POSITION DEPENDENTS; SUPPORT RINGS; THERMO-ELASTIC DEFORMATIONS; X RAY MASK;

X RAY LITHOGRAPHY;

EID: 4243484305     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-9002(01)00655-6     Document Type: Article

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