Banding reduction in electrophotographic process using closed-loop controlled piezoelectric laser beam deflection device

ASME International Mechanical Engineering Congress and Exposition, Proceedings (IMECE)

Volumn 2000-N, Issue , 2000, Pages 203-210

  Ewe, Michael T S ^a   Chiu, George T C ^a   Allebach, Jan P ^a   Chan, C S ^b   Foote, Wayne ^b  

^a PURDUE UNIVERSITY   (United States)

^b HEWLETT PACKARD COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LASER BEAMS; PROCESS CONTROL;

BANDING REDUCTION; BEAM POSITIONS; CLOSED LOOP CONTROL STRATEGY; CLOSED-LOOP; ELECTROPHOTOGRAPHIC PROCESS; EMPIRICAL MODEL; IMAGE ARTEFACTS; LASER BEAM DEFLECTION; PIEZOELECTRIC; SYSTEM IDENTIFICATION TECHNIQUES;

PIEZOELECTRICITY;

EID: 4243356236     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1115/IMECE2000-2303     Document Type: Conference Paper

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