Ion beam synthesis of Ni-Fe-Si layer by TEM

Surface and Coatings Technology

Volumn 103-104, Issue , 1998, Pages 231-234

  Li, X N ^a,b   Dong, C ^a   Jin, S ^c   Ma, T C ^a   Zhang, Q Y ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^c IMEC   (Belgium)

Author keywords

Grain growth; MEVVA; Ni Fe silicide; Thermal anealing

Indexed keywords

ANNEALING; FILMS; GRAIN GROWTH; GRAIN SIZE AND SHAPE; IRON; MORPHOLOGY; NICKEL; NICKEL COMPOUNDS; PHASE TRANSITIONS; SILICON WAFERS; TRANSMISSION ELECTRON MICROSCOPY;

ION BEAM SYNTHESIS; METAL VAPOUR VACUUM ARC ION IMPLANTATION;

ION IMPLANTATION;

EID: 4243222264     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00400-9     Document Type: Article

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