Exchange coupling in NiO/Ni double layer films

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 7 SUPPL. B, 1996, Pages

  Shimazawa, Koji ^a   Baba, Toshinori ^a   Kobayashi, Koji ^a   Shinagawa, Kiminari ^a   Saito, Toshiaki ^a   Tsushima, Tachiro ^a  

^a TOHO UNIVERSITY   (Japan)

Author keywords

Coercive force; Exchange coupling field; NiO Ni film; Thermal oxidation; Vacuum evaporation method

Indexed keywords

COERCIVE FORCE; DEPOSITION; EVAPORATION; FILM PREPARATION; GRAIN SIZE AND SHAPE; NICKEL; NICKEL COMPOUNDS; OXIDATION; SURFACE ROUGHNESS; TEMPERATURE; VACUUM APPLICATIONS;

DOUBLE LAYER FILM; EXCHANGE COUPLING; NICKEL OXIDE; THERMAL OXIDATION; VACUUM EVAPORATION;

MULTILAYERS;

EID: 4243139868     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.l890     Document Type: Article

References (10)

1. W. H. Meiklejohn: J. Appl. Phys. 33 (1962) 1328.
2. M. J. Carey and A. E. Berkowitz: Appl. Phys. Lett. 60 (1992) 3060.
3. V. S. Speriosu, D. A. Herman, I. L. Sanders and T. Yagi: IBM J. Res. Dev. 34 (1990) 884.
4. A. E. Berkowitz and J. H. Greiner: J. Appl. Phys. 36 (1965) 3330.
5. Ching Tsang, Mao-Min Chen and T. Yogi: Proc. IEEE 81 (1993) 1344.
6. S. Soeya, M. Fuyama, S. Tadokoro and T. Imagawa: J. Appl. Phys. 79 (1996) 1604.
7. T. J. Moran, J. M. Gallego and Ivan K. Schuller: J. Appl. Phys. 78 (1995) 1887.
8. B. A. Movchan and A. V. Demchishin: Fiz. Met. Metalloved. 28 (1969) 83.
9. J. T. Richardson, D. I. Yiagas, B. Turk and K. Forster: J. Appl. Phys. 70 (1991) 6977.
10. C. Lai, H. Matsuyama, R. L. White and T. C. Anthony: IEEE Trans. Mag. 31 (1995) 2609.