SCOPUS 정보 검색 플랫폼

Volumn 35-36, Issue PART 1, 1980, Pages 249-254

Laser annealing of glow discharge amorphous silicon

Author keywords

[No Author keywords available]

Indexed keywords

LASER BEAMS - APPLICATIONS; SEMICONDUCTING FILMS - HEAT TREATMENT;

SEMICONDUCTING SILICON;

EID: 4243096758 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/0022-3093(80)90602-X Document Type: Article

Times cited : (10)

References (17)

1
- 84916011975
- See for instance, Berlin (West), D Reidel, Dordrecht
- (1979) Proc of the Int Conf on Photovoltaic Solar Energy

2
- 0001644156
- (1979) Appl Phys Lett , vol.34 , Issue.5 , pp. 337
- Seager¹ Ginley²

3
- 84916016586
- and references in it
- (1978) RCA Internal Report, SAN1286-8
- Carlson¹

4
- 0018470704
- (1979) J of Electronic Materials , vol.8 , Issue.3 , pp. 391
- Moustakas¹

7
- 0014438143
- The Preparation and Properties of Amorphous Silicon
- (1969) Journal of The Electrochemical Society , vol.116 , pp. 77
- Chittick¹ Alexander² Sterling³

9
- 33745935178
- (1977) Phys Rev B , vol.16 , Issue.8 , pp. 3556
- Brodsky¹ Cardona² Cuomo³

10
- 0018688064
- (Invited) Characterization of Plasma-Deposited Amorphous Si: H Thin Films
- (1979) Japanese Journal of Applied Physics , vol.18 , pp. 101
- Knights¹

11
- 0016142189
- Stuttgart, B G Teubner, Stuttgart
- (1974) Proc of 12th Conf on Physics of Semiconductors , pp. 1042
- Engemann¹ Fischer²

15
- 0001574468
- (1978) Phys Rev B , vol.18 , Issue.4 , pp. 1880
- Street¹ Knights² Biegelsen³

16
- 84916065098
- (1979) J Appl Phys , vol.50 , pp. 37
- Hirose¹ Taniguchi² Osaka³

17
- 0000028190
- (1976) Appl Phys Lett , vol.29 , Issue.9 , pp. 620
- Pankove¹ Carlson²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.