Photocatalytic lithography processing via poly(vinyl butyral)/TiO 2 photoresists by ultraviolet (UV) exposure

Industrial and Engineering Chemistry Research

Volumn 47, Issue 7, 2008, Pages 2273-2278

  Liau, Leo Chau Kuang ^a   Chou, Wen Wei ^a   Wu, Rung Kang ^a  

^a YUAN ZE UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOCATALYSIS; SUBSTRATES; SURFACE MORPHOLOGY; ULTRAVIOLET RADIATION;

PATTERN-FORMING PROCESS; PHOTOCATALYTIC LITHOGRAPHY;

PHOTORESISTS;

PHOTOCATALYSIS; PHOTORESISTS; SUBSTRATES; SURFACE MORPHOLOGY; ULTRAVIOLET RADIATION;

EID: 42349094545     PISSN: 08885885     EISSN: None     Source Type: Journal    
DOI: 10.1021/ie071331o     Document Type: Article

References (8)

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