-
2
-
-
11144358008
-
-
2
-
T. Tang, S. Han, W. Jin, X. Liu, C. Li, D. Zhang, C. Zhou, B. Chen, J. Han, M. Meyyapan, J. Mater. Res. 19(2), 423 (2004).
-
(2004)
J. Mater. Res.
, vol.19
, pp. 423
-
-
Tang, T.1
Han, S.2
Jin, W.3
Liu, X.4
Li, C.5
Zhang, D.6
Zhou, C.7
Chen, B.8
Han, J.9
Meyyapan, M.10
-
3
-
-
33746910200
-
-
T. Stoica, R.J. Meijers, R. Calarco, T. Richter, E. Sutter, H. Lüth, Nano Lett. 6, 1541 (2006).
-
(2006)
Nano Lett.
, vol.6
, pp. 1541
-
-
Stoica, T.1
Meijers, R.J.2
Calarco, R.3
Richter, T.4
Sutter, E.5
Lüth, H.6
-
4
-
-
33747461769
-
-
T. Kang, X. Liu, R.Q. Zhang, W.G. Hu, G. Cong, F. Zhao, Q. Zhu, Appl. Phys. Lett. 89, 071113 (2006).
-
(2006)
Appl. Phys. Lett.
, vol.89
, pp. 071113
-
-
Kang, T.1
Liu, X.2
Zhang, R.Q.3
Hu, W.G.4
Cong, G.5
Zhao, F.6
Zhu, Q.7
-
5
-
-
0036227003
-
-
J. Zhang, L. Zhang, X. Peng, X. Wang, J. Mater. Chem. 12, 802 (2002).
-
(2002)
J. Mater. Chem.
, vol.12
, pp. 802
-
-
Zhang, J.1
Zhang, L.2
Peng, X.3
Wang, X.4
-
6
-
-
12844252595
-
-
M.C. Johnson, C.J. Lee, E.D. Bourret-Courchesne, S.L. Konsek, S. Aloni, W.Q. Han, A. Zettl, Appl. Phys. Lett. 85, 5670 (2004).
-
(2004)
Appl. Phys. Lett.
, vol.85
, pp. 5670
-
-
Johnson, M.C.1
Lee, C.J.2
Bourret-Courchesne, E.D.3
Konsek, S.L.4
Aloni, S.5
Han, W.Q.6
Zettl, A.7
-
7
-
-
24644432626
-
-
C.Y. Chang, G.C. Chi, W.M. Wang, L.C. Chen, K.H. Chen, F. Ren, S.J. Pearton, Appl. Phys. Lett. 87, 093112 (2005).
-
(2005)
Appl. Phys. Lett.
, vol.87
, pp. 093112
-
-
Chang, C.Y.1
Chi, G.C.2
Wang, W.M.3
Chen, L.C.4
Chen, K.H.5
Ren, F.6
Pearton, S.J.7
-
8
-
-
29144473725
-
-
G. Cheng, E. Stern, D. Turner-Evans, M.A. Reed, Appl. Phys. Lett. 87, 253103 (2005).
-
(2005)
Appl. Phys. Lett.
, vol.87
, pp. 253103
-
-
Cheng, G.1
Stern, E.2
Turner-Evans, D.3
Reed, M.A.4
-
10
-
-
79955985042
-
-
1
-
C.H. Liang, L.C. Chen, J.S. Hwang, K.H. Chen, Y.T. Hung, Y.F. Chen, Appl. Phys. Lett. 81(1), 22 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.81
, pp. 22
-
-
Liang, C.H.1
Chen, L.C.2
Hwang, J.S.3
Chen, K.H.4
Hung, Y.T.5
Chen, Y.F.6
-
11
-
-
24344490764
-
-
8
-
S. Vaddiraju, A. Mohite, A. Chin, M. Meyyappan, G. Sumanasekera, B.W. Alphenaar, M.K. Sunkara, Nano Lett. 5(8), 1625 (2005).
-
(2005)
Nano Lett.
, vol.5
, pp. 1625
-
-
Vaddiraju, S.1
Mohite, A.2
Chin, A.3
Meyyappan, M.4
Sumanasekera, G.5
Alphenaar, B.W.6
Sunkara, M.K.7
-
12
-
-
9644272381
-
-
20
-
L.W. Yin, Y. Bando, D. Golberg, M.S. Li, Adv. Mater. 16(20), 1833 (2004).
-
(2004)
Adv. Mater.
, vol.16
, pp. 1833
-
-
Yin, L.W.1
Bando, Y.2
Golberg, D.3
Li, M.S.4
-
13
-
-
0009543589
-
-
ed. M.E. Levinshtein, S.L. Rumyantsev, and M.S. Shur (New York: Wiley)
-
A. Zubrilov, Properties of Advanced Semiconductor Materials GaN, AlN, InN, BN, SiC, SiGe, ed. M.E. Levinshtein, S.L. Rumyantsev, and M.S. Shur (New York: Wiley, 2001), pp. 49-66.
-
(2001)
Properties of Advanced Semiconductor Materials GaN, AlN, InN, BN, SiC, SiGe
, pp. 49-66
-
-
Zubrilov, A.1
-
14
-
-
0242457283
-
-
16
-
Z.H. Wu, X. Mei, D. Kim, M. Blumin, H.E. Ruda, J.Q. Liu, K.L. Kavanagh, Appl. Phys. Lett. 83(16), 3368 (2003).
-
(2003)
Appl. Phys. Lett.
, vol.83
, pp. 3368
-
-
Wu, Z.H.1
Mei, X.2
Kim, D.3
Blumin, M.4
Ruda, H.E.5
Liu, J.Q.6
Kavanagh, K.L.7
-
15
-
-
0035398186
-
-
W. Braun, V.M. Kaganer, A. Trampert, H. Schonherr, Q. Gong, R. Notzel, L. Daweritz, K.H. Ploog, J. Cryst. Growth 227-228, 51 (2001).
-
(2001)
J. Cryst. Growth
, vol.227-228
, pp. 51
-
-
Braun, W.1
Kaganer, V.M.2
Trampert, A.3
Schonherr, H.4
Gong, Q.5
Notzel, R.6
Daweritz, L.7
Ploog, K.H.8
-
16
-
-
1042289092
-
-
J. Lao, J. Huang, D. Wang, Z. Ren, Adv. Mater. 16, 65 (2004).
-
(2004)
Adv. Mater.
, vol.16
, pp. 65
-
-
Lao, J.1
Huang, J.2
Wang, D.3
Ren, Z.4
-
19
-
-
1442330252
-
-
X.Y. Kong, Y. Ding, R. Yang, Z.L. Wang, Science 303, 1348 (2004).
-
(2004)
Science
, vol.303
, pp. 1348
-
-
Kong, X.Y.1
Ding, Y.2
Yang, R.3
Wang, Z.L.4
-
22
-
-
0000823384
-
-
Y. Huang, X. Duan, Y. Cui, C.M. Lieber, Nano Lett. 2, 101 (2002).
-
(2002)
Nano Lett.
, vol.2
, pp. 101
-
-
Huang, Y.1
Duan, X.2
Cui, Y.3
Lieber, C.M.4
-
23
-
-
0031163082
-
-
S. Niwa, M. Yamaguchi, T. Suzuki, N. Sawaki, Jpn. J. Appl. Phys., Part I 36, 3675 (1997).
-
(1997)
Jpn. J. Appl. Phys., Part i
, vol.36
, pp. 3675
-
-
Niwa, S.1
Yamaguchi, M.2
Suzuki, T.3
Sawaki, N.4
-
24
-
-
34247235176
-
-
V. Cimalla, V. Lebedev, Ch.Y. Wang, M. Ali, G. Ecke, V.M. Polyakov, F. Schwierz, O. Ambacher, H. Lu, W.J. Schaff, Appl. Phys. Lett. 90, 152106 (2007).
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 152106
-
-
Cimalla, V.1
Lebedev, V.2
Wang, Ch.Y.3
Ali, M.4
Ecke, G.5
Polyakov, V.M.6
Schwierz, F.7
Ambacher, O.8
Lu, H.9
Schaff, W.J.10
-
25
-
-
31644442135
-
-
J.S. Thakur, R. Naik, V.M. Naik, D. Haddad, G.W. Auner, H. Lu, W.J. Schaff, J. Appl. Phys. 99, 023504 (2006).
-
(2006)
J. Appl. Phys.
, vol.99
, pp. 023504
-
-
Thakur, J.S.1
Naik, R.2
Naik, V.M.3
Haddad, D.4
Auner, G.W.5
Lu, H.6
Schaff, W.J.7
-
26
-
-
3342884539
-
-
C.H. Swartz, R.P. Tompkins, N.C. Giles, T.H. Myers, H. Lu, W.J. Schaff, L.F. Eastman, J. Cryst. Growth 269, 29 (2004).
-
(2004)
J. Cryst. Growth
, vol.269
, pp. 29
-
-
Swartz, C.H.1
Tompkins, R.P.2
Giles, N.C.3
Myers, T.H.4
Lu, H.5
Schaff, W.J.6
Eastman, L.F.7
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