Study of etched (210)-oriented thin garnet films

Journal of Applied Physics

Volumn 103, Issue 7, 2008, Pages

  Tkachuk, S ^a   Bowen, D ^a   Nistor, I ^b   Krafft, C ^c   Mayergoyz, I ^a  

^a UNIVERSITY OF MARYLAND   (United States)

^b ABB SWITZERLAND LTD   (Switzerland)

^c LABORATORY FOR PHYSICAL SCIENCES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; ETCHING; GARNETS; MAGNETIZATION;

THICKNESS REDUCTION; THIN GARNET FILMS;

THIN FILMS;

EID: 42149138535     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2828715     Document Type: Conference Paper

References (3)

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2. I. Nistor, C. Holthaus, S. Tkachuk, I. D. Mayergoyz, and C. Krafft, J. Appl. Phys. 101, 09C526 (2007).
3. E. M. Gyorgy, A. Rosencwaig, E. I. Blount, W. J. Tabor, and M. E. Lines, Appl. Phys. Lett. 18, 479 (1971).