Photocatalytic lithography based on thin films of amorphous hydrated titanium dioxide

High Energy Chemistry

Volumn 42, Issue 2, 2008, Pages 127-131

  Skorb, E V ^a   Sokolov, V G ^b   Byk, T V ^b   Gaevskaya, T V ^b   Sviridov, D V ^a   Noh, Chang Ho ^c  

^a BELARUSIAN STATE UNIVERSITY   (Belarus)

^b BELARUSIAN STATE UNIVERSITY   (Belarus)

^c Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 42149115703     PISSN: 00181439     EISSN: 16083148     Source Type: Journal    
DOI: 10.1007/s10733-008-2012-x     Document Type: Article

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