Point-by-point inscription of 250 nm period structure in bulk fused silica by tightly focused femtosecond UV pulses

Journal of Optics A: Pure and Applied Optics

Volumn 10, Issue 2, 2008, Pages

  Dubov, M ^a   Bennion, I ^a   Nikogosyan, D N ^a,b   Bolger, P ^c   Zayats, A V ^c  

^a ASTON UNIVERSITY   (United Kingdom)

^b UNIVERSITY COLLEGE CORK   (Ireland)

^c QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

Author keywords

Atomic force microscopy; Differential interference contrast microscopy; Femtosecond UV laser; Fused silica; Microfabrication; Nanostructure

Indexed keywords

ATOMIC FORCE MICROSCOPY; FUSED SILICA; MICROFABRICATION; NANOSTRUCTURES; SAPPHIRE;

DIFFERENTIAL INTERFERENCE CONTRAST MICROSCOPY; SAPPHIRE LASERS;

ULTRASHORT PULSES;

EID: 41949085087     PISSN: 14644258     EISSN: 17413567     Source Type: Journal    
DOI: 10.1088/1464-4258/10/2/025305     Document Type: Article

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