Deposition of Ti-6Al-4V using a high power diode laser and wire, Part I: Investigation on the process characteristics

Surface and Coatings Technology

Volumn 202, Issue 16, 2008, Pages 3933-3939

  Mok, Sui Him ^a   Bi, Guijun ^a   Folkes, Janet ^a   Pashby, Ian ^a  

^a UNIVERSITY OF NOTTINGHAM   (United Kingdom)

Author keywords

Deposition; Diode laser; Ti6Al4V

Indexed keywords

DEPOSITION; HARDNESS; HEAT AFFECTED ZONE; MICROSTRUCTURE; TITANIUM;

FEEDING ORIENTATION;

SEMICONDUCTOR LASERS;

DEPOSITION; HARDNESS; HEAT AFFECTED ZONE; MICROSTRUCTURE; SEMICONDUCTOR LASERS; TITANIUM;

EID: 41849101484     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.02.008     Document Type: Article

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