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Volumn 128, Issue 13, 2008, Pages

Photofragmentation of Si F4 upon Si 2p and F 1s core excitation: Cation and anion yield spectroscopy

Author keywords

[No Author keywords available]

Indexed keywords

IONIZATION; NEGATIVE IONS; PHOTOEXCITATION; POSITIVE IONS; RYDBERG STATES; SILICON COMPOUNDS; X RAY ANALYSIS;

EID: 41849101036     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2851135     Document Type: Article
Times cited : (8)

References (41)
  • 6
    • 41849123194 scopus 로고
    • Plasma Etching: Fundamentals and Applications (Oxford University Press, Oxford).
    • M. Sugewara, Plasma Etching: Fundamentals and Applications (Oxford University Press, Oxford, 1988).
    • (1988)
    • Sugewara, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.