Texturing mechanism of SI using hydrogen radicals

Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4

Volumn 2, Issue , 2006, Pages 1411-1414

  Nagayoshi, Hiroshi ^a   Nishimura, Suzuka ^b   Terashima, Kazutaka ^b   Ulyashin, Alexander ^c  

^a TOKYO NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b SHONAN INSTITUTE OF TECHNOLOGY   (Japan)

^c UNIVERSITY OF OSLO   (Norway)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; HYDRIDES; SILICA;

HYDROGEN RADICALS; TEXTURING MECHANISM;

HYDROGEN;

EID: 41749108161     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/WCPEC.2006.279716     Document Type: Conference Paper

References (6)

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