|
Volumn 2, Issue , 2006, Pages 1473-1476
|
Implementation of highly stable microcrystalline silicon by VHF PECVD at high deposition rate in micromorph tandem cells
|
Author keywords
[No Author keywords available]
|
Indexed keywords
GROWTH KINETICS;
OPTICAL EMISSION SPECTROSCOPY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SOLAR CELLS;
DEVICE QUALITY;
MICROMORPH TANDEM CELLS;
MICROCRYSTALLINE SILICON;
|
EID: 41749085246
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/WCPEC.2006.279747 Document Type: Conference Paper |
Times cited : (9)
|
References (7)
|