Photoelectrochemical study of inhibition mechanism of PASP on copper

Huagong Xuebao/Journal of Chemical Industry and Engineering (China)

Volumn 59, Issue 3, 2008, Pages 665-669

  Zhu, Lujun ^a,b   Xu, Qunjie ^a   Cao, Weimin ^b   Wan, Zongyue ^b   Yin, Renhe ^b   Zhou, Guoding ^a   Lin, Changjian ^c  

^a SHANGHAI UNIVERSITY OF ELECTRIC POWER   (China)

^b SHANGHAI UNIVERSITY   (China)

^c XIAMEN UNIVERSITY   (China)

Author keywords

Copper; Inhibitor; PASP; Photoelectrochemistry

Indexed keywords

CATHODIC POLARIZATION; CORROSION INHIBITORS; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMISTRY; ELECTRODES; PHOTOCHEMICAL REACTIONS; PHOTOELECTRICITY; POLYMERS;

BORAX BUFFER SOLUTION; COPPER ELECTRODE; INHIBITION MECHANISM; PHOTOCURRENT RESPONSE; PHOTOELECTROCHEMISTRY; POLYASPARTIC (PASP);

COPPER CORROSION;

EID: 41649108877     PISSN: 04381157     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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