Thermal-field treatment for creating single-crystal tungsten tips with ultimate sharpness

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 2, 2008, Pages 738-744

  Fujita, Shin ^a,b   Shimoyama, Hiroshi ^a  

^a MEIJO UNIVERSITY   (Japan)

^b SHIMADZU CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; SINGLE CRYSTALS; THERMAL EFFECTS; VOLTAGE CONTROL;

THERMAL FIELD TREATMENT; TUNGSTEN TIPS;

TUNGSTEN;

EID: 41549148214     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2835069     Document Type: Article

References (11)

1. A. J. Melmed, J. Vac. Sci. Technol. B 9, 601 (1991).
2. Y. Saito, K. Hata, and T. Murata, Jpn. J. Appl. Phys., Part 2 39, L271 (2000).
3. H. W. Fink, IBM J. Res. Dev. 30, 460 (1986).
4. T. Y. Fu, L. C. Cheng, C. H. Nien, and T. T. Tsong, Phys. Rev. B 64, 113401 (2001).
5. V. T. Binh, S. T. Purcell, N. Garcia, and J. Donglioni, Phys. Rev. Lett. 69, 2527 (1992).
6. P. C. Bettler and F. M. Charbonnier, Phys. Rev. 119, 85 (1960).
7. A. V. Crew, D. N. Eggenberger, J. Wall, and L. M. Welter, Rev. Sci. Instrum. 39, 576 (1968).
8. H. Shimoyama, in Proceedings of Fourth International Display Workshop, Nagoya, 1997 (unpublished), p. 763.
9. S. Fujita and H. Shimoyama, Phys. Rev. B 75, 235431 (2007).
10. S. Fujita, Ph.D. thesis, Meijo University, 2007.
11. S. Fujita and H. Shimoyama, Japanese Patent No. 2007-79736 (26 March 2007).