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Volumn 990, Issue , 2007, Pages

Materials, Processes, Integration and Reliability in Advanced Interconnects for Micro- and Nanoelectronics
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Author keywords

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Indexed keywords

CURING; DIELECTRIC MATERIALS; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

EID: 41549124678     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Review
Times cited : (1)

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