Adsorption mechanism for imprinted ion (Ni2+) of the surface molecular imprinting adsorbent (SMIA)

Biochemical Engineering Journal

Volumn 39, Issue 3, 2008, Pages 503-509

  Su, Haijia ^a   Li, Jia ^a   Tan, Tianwei ^a  

^a BEIJING UNIVERSITY OF CHEMICAL TECHNOLOGY   (China)

Author keywords

Adsorption mechanism; Fourier transform infrared spectrometry; Metal ion; The surface molecular imprinting adsorbent (SMIA); X ray photoelectron spectroscopy

Indexed keywords

SPECIFIC SURFACE AREA ANALYSES; SURFACE MOLECULAR IMPRINTING ADSORBENT (SMIA);

ADSORPTION; CHITOSAN; CROSSLINKING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

NICKEL COMPOUNDS;

ADSORBENT; AMMONIA; CHITOSAN; HYDROXIDE; NICKEL; SURFACE MOLECULAR IMPRINTING ADSORBENT; UNCLASSIFIED DRUG;

ADSORPTION KINETICS; ARTICLE; INFRARED SPECTROSCOPY; PRIORITY JOURNAL; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 41549120655     PISSN: 1369703X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.bej.2007.11.011     Document Type: Article

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