SCOPUS 정보 검색 플랫폼

Volumn 103, Issue 6, 2008, Pages

Transmission electron microscopy study of the oxidation of TiN layers during sputtering process

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; CRYSTAL STRUCTURE; DELAMINATION; SPUTTER DEPOSITION; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY;

ANATASE PHASE; CROSS-SECTIONAL IMAGES; CRYSTAL SUBSTRATES; SPUTTERING PROCESS;

TITANIUM NITRIDE;

EID: 41549086085 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.2899180 Document Type: Article

Times cited : (2)

References (10)

1
- 79956057961
- APPLAB 0003-6951 10.1063/1.1428413.
- Y. Wang, C. Ganpule, B. T. Liu, H. Li, K. Mori, B. Hill, M. Wuttig, and R. Ramesh, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1428413 80, 97 (2002).
- (2002) Appl. Phys. Lett. , vol.80 , pp. 97
- Wang, Y.¹ Ganpule, C.² Liu, B.T.³ Li, H.⁴ Mori, K.⁵ Hill, B.⁶ Wuttig, M.⁷ Ramesh, R.⁸

2
- 33846436035
- APPLAB 0003-6951 10.1063/1.2431572.
- Y.-C. Chieh, C.-C. Yu, and F.-H. Lu, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2431572 90, 032904 (2007).
- (2007) Appl. Phys. Lett. , vol.90 , pp. 032904
- Chieh, Y.-C.¹ Yu, C.-C.² Lu, F.-H.³

3
- 0030142075
- JAPLD8 0021-4922.
- M. B. Lee, M. Kawasaki, M. Yoshimoto, and H. Koinuma, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922 35, L574 (1996).
- (1996) Jpn. J. Appl. Phys., Part 2 , vol.35 , pp. 574
- Lee, M.B.¹ Kawasaki, M.² Yoshimoto, M.³ Koinuma, H.⁴

4
- 41549167728
- MRS 2006 Fall Proceedings T, (unpublished), Vol., Paper No. 0966-T07-21.
- C. Wang and M. H. Kryder, MRS 2006 Fall Proceedings T, 2006 (unpublished), Vol. 966E, Paper No. 0966-T07-21.
- (2006) , vol.966
- Wang, C.¹ Kryder, M.H.²

5
- 0000715165
- APPLAB 0003-6951 10.1063/1.118247.
- P. C. McIntyre, S. R. Summerfelt, and C. J. Maggiore, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.118247 70, 711 (1996).
- (1996) Appl. Phys. Lett. , vol.70 , pp. 711
- McIntyre, P.C.¹ Summerfelt, S.R.² Maggiore, C.J.³

6
- 0019633490
- JAPIAU 0021-8979 10.1063/1.328659.
- M. Wittmer, J. Noser, and H. Melchior, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.328659 52, 6659 (1981).
- (1981) J. Appl. Phys. , vol.52 , pp. 6659
- Wittmer, M.¹ Noser, J.² Melchior, H.³

7
- 36449001763
- JAPIAU 0021-8979 10.1063/1.351465.
- N. C. Saha and H. G. Tompkins, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.351465 72, 3072 (1992).
- (1992) J. Appl. Phys. , vol.72 , pp. 3072
- Saha, N.C.¹ Tompkins, H.G.²

8
- 0037667843
- JAPNDE 0021-4922 10.1143/JJAP.42.582.
- H.-J. Sun, K.-M. Kim, Y. Kim, K.-J. Cho, K-S. Park, J.-M. Lee, and J.-S. Roh, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 10.1143/JJAP.42.582 42, 582 (2003).
- (2003) Jpn. J. Appl. Phys., Part 1 , vol.42 , pp. 582
- Sun, H.-J.¹ Kim, K.-M.² Kim, Y.³ Cho, K.-J.⁴ Park, K.-S.⁵ Lee, J.-M.⁶ Roh, J.-S.⁷

9
- 0029371576
- JAPNDE 0021-4922 10.1143/JJAP.34.5224.
- K. Takemura, S. Yamamichi, P.-Y. Lesaicherre, K. Tokashiki, H. Miyamoto, H. Ono, Y. Miyasaka, and M. Yoshida, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 10.1143/JJAP.34.5224 34, 5224 (1995).
- (1995) Jpn. J. Appl. Phys., Part 1 , vol.34 , pp. 5224
- Takemura, K.¹ Yamamichi, S.² Lesaicherre, P.-Y.³ Tokashiki, K.⁴ Miyamoto, H.⁵ Ono, H.⁶ Miyasaka, Y.⁷ Yoshida, M.⁸

10
- 0040870462
- APPLAB 0003-6951 10.1063/1.109829.
- M. D. Graef and D. R. Clarke, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.109829 63, 1044 (1993).
- (1993) Appl. Phys. Lett. , vol.63 , pp. 1044
- Graef, M.D.¹ Clarke, D.R.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.