Electrostatic deflection aberrations revisited: Solution proposed to an old problem

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2725-2728

  Retsky, Michael ^a  

^a Electron Optics Development Co LLC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4143154037     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589715     Document Type: Article

References (13)

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2. H. Moss, Narrow Angle Electron Guns and Cathode Ray Tubes (Academic, New York, 1968), pp. 113 and 116.
3. SPIE Handbook of Microlithography, Section 2.2 Elements of Electron Optics (SPIE, Bellingham, WA, 1997).
4. R. G. E. Hutter, J. Appl. Phys. 18, 740 (1947); 18, 797 (1947).
5. R. G. E. Hutter, J. Appl. Phys. 18, 740 (1947); 18, 797 (1947).
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7. K. Kanaya and N. Baba, J. Phys. E: Sci. Instrum. 13, 415 (1980).
8. D. E. Wolverton, Advance for Administrators in Radiology April 1997, pp. 46-48.
9. L. L. Fajardo and M. B. Williams, Ref. 7, pp. 24-38.
10. N. Karssemeijer et al., Invest. Radiol. 28, 413 (1993).
11. M. Retsky, A New Method to Reduce Electrostatic Deflection Defocusing in CRTs and Other Devices. Society for Information Display (SID, Santa Ana, 1997).
12. M. Retsky, Proc. SPIE 3155, 89 (1997).
13. R. Feynman (http://nano.xerox.com/nanotech/feynman.html)