Direct aerial image measurements to evaluate the performance of an extreme ultraviolet projection lithography system

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4000-4003

  Fields, C H ^a   Oldham, W G ^a   Ray Chaudhuri, A K ^b   Krenz, K D ^b   Stulen, R H ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4143139442     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588631     Document Type: Article

References (5)

1. B. Lai, F. Cerrina, and J. H. Underwood, Appl. of Thin-Film Multilayered Structures to Figures X-ray Optics, Proc. SPIE 563 (1985).
2. B. La Fontaine, T. P. Daly, D. P. Gains, G. E. Sommargren, D. G. Stearns, D. W. Sweeney, and D. R. Kania, Measuring the Effect of Scatter on the Performance of a Lithography System, OSA Proceedings on Extreme Ultraviolet Lithography (Optical Society of America, Boston, 1996).
3. D. G. Stearns, D. P. Gains, B. La Fontaine, G. E. Sommargren, D. W. Sweeney, D. R. Kania, and N. M. Ceglio, Nonspecular Scattering in EUV Lithography: Determining Specification for Surface Finish, OSA Proceedings on Extreme Ultraviolet Lithography (Optical Society of America, Boston, 1996).
4. W. N. Partlo, C. H. Fields, and W. G. Oldham, J. Vac. Sci. Technol. B 11, 2686 (1993).
5. R. Korde, SPIE Proc. 1140, 126 (1989).