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Journal of Applied Physics

Volumn 79, Issue 7, 1996, Pages 3640-3644

Shallow Si/Pd-based ohmic contacts to n-Al0.5In0.5P

(5) Hao, P H a Wang, L C a Chang, J C P b Kuo, H C c,d Kuo, J M c

a Texas AandM University (United States)

b PURDUE UNIVERSITY (United States)

c LUCENT TECHNOLOGIES (United States)

d UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4143130499 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.361191 Document Type: Article

Times cited : (6)

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