Comparison between electron yield, PSD ion yield, and surface Pipico yield in near C and O K-edge XAFS in condensed methyl formate-D

Journal De Physique. IV : JP

Volumn 7, Issue 2 Part 1, 1997, Pages

  Sekiguchi, T ^a   Sekiguchi, H I ^b   Obi, K ^c   Tanaka, K ^d  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^d HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4143104746     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (7)

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3. Menzel D., Rocker G., Steinrück H.P., Coulman D., Heimann P.A., Huber W., Zebisch P., and Lloyd D.R., J.Chem.Phys 96(1992)1724-1734; Menzel D., AIP Conf. Proc., No.258 "Synchrotron Radiation and Dynamic Phenomena", Eds. Beswick A (AIP 1992) pp.387-396.
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7. Ishii I. and Hitchcock A.P., J. Electron Spectrosc. Relat. Phenom. 46 (1988)55-84.