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Volumn 243, Issue 1-3, 2004, Pages 139-145
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Self-association processes of short-chain anionic surfactant in silica dispersions from 13C NMR
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Author keywords
Chemical shifts; NMR relaxation; Short chain surfactants; Surfactant adsorption; Surfactants self association
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Indexed keywords
CARBON;
CONCENTRATION (PROCESS);
DISPERSIONS;
NUCLEAR MAGNETIC RESONANCE;
PH;
POSITIVE IONS;
POTASSIUM COMPOUNDS;
SILICA;
SOLUTIONS;
TERNARY SYSTEMS;
AQUEOUS DISPERSIONS;
CHEMICAL SHIFTS;
IONIC SURFACTANTS;
RELAXATION TIMES;
SURFACE ACTIVE AGENTS;
ANIONIC SURFACTANT;
CARBON;
HYDROXYL GROUP;
IONIC SURFACTANT;
NONANOIC ACID;
SILICON DIOXIDE;
WATER;
ADSORPTION;
AQUEOUS SOLUTION;
ARTICLE;
CARBON NUCLEAR MAGNETIC RESONANCE;
CHEMICAL INTERACTION;
CHEMICAL STRUCTURE;
COMPARATIVE STUDY;
CONCENTRATION (PARAMETERS);
DISPERSION;
HYDROGEN BOND;
HYDROPHOBICITY;
PH;
PRIORITY JOURNAL;
PROTON NUCLEAR MAGNETIC RESONANCE;
SENSITIVITY ANALYSIS;
SOLID;
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EID: 4143104682
PISSN: 09277757
EISSN: None
Source Type: Journal
DOI: 10.1016/j.colsurfa.2004.05.019 Document Type: Article |
Times cited : (4)
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References (21)
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