Practical approach to separating the pattern generator-induced mask CD errors from the blank/process-induced mask CD errors using conventional market measurements

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2243-2248

  Han, Liqun ^a   Wang, Weidong ^a   McCord, Mark A ^a   Berglund, C N ^a   Pease, R F W ^a   Weaver, L Suzanne ^b  

^a STANFORD UNIVERSITY   (United States)

^b Etec Systems   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4143085059     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589622     Document Type: Article

References (7)

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6. R. N. Bracewell, Two-Dimensional Imaging (Prentice Hall, New Jersey, 1995), Chap. 13.
7. Jun Ye, C. N. Berglund, J. Robinson, and R. F. W. Pease, IEEE Trans. Semicond. Manuf. 8, 319 (1995).