Anisotropy in resistivity of MoNx films at 4.2 K

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 5, 1996, Pages 3395-3399

  Kominami, Shin'ya ^a   Mita, Reiko ^a   Nishino, Toshikazu ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4143085030     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588542     Document Type: Article

References (5)

1. T. Shiota, S. Kotani, T. Imamura, and S. Hasuo, in Extended Abstracts of ISEC '93, Boulder, 1993 (unpublished), pp. 120-121.
2. L. A. Abelson, R. Elmadjian, E. Ladizinsky, A. Lee, and H. W. Chan, in Extended Abstracts of ISEC '93, Boulder, 1993 (unpublished), pp. 270-271.
3. S. Tahara, S. Nagasawa, H. Numata, Y. Hashimoto, S. Yorozu, and H. Matsuoka, in Extended Abstracts of ISEC '95, Nagoya, 1995 (unpublished) pp. 23-26.
4. S. Kominami, H. Yamada, N. Miyaraoto, and K. Takagi, IEEE Trans. Appl. Supercond. 3, 2182 (1993).
5. A. F. Mayadas and M. Shatzkes, Phys. Rev. B 1, 1382 (1970).