Novel thermally resistant polysilphenylene-siloxanes with a high content of vinyl substituents

Polymer International

Volumn 53, Issue 9, 2004, Pages 1259-1265

  Liu, Yang ^a   Imae, Ichiro ^a   Kawakami, Yusuke ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Enhanced thermal stability; High temperature polymers; Polysilphenylenesiloxane; Residual yield; Vinyl substituents

Indexed keywords

HEAT RESISTANCE; HIGH TEMPERATURE EFFECTS; MOLECULAR STRUCTURE; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; SILICON; SYNTHESIS (CHEMICAL); THERMODYNAMIC STABILITY;

RESIDUAL YIELDS; SILOXANES;

POLYMERS;

POLYMER SCIENCE;

EID: 4143077053     PISSN: 09598103     EISSN: None     Source Type: Journal    
DOI: 10.1002/pi.1506     Document Type: Article

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