Defect printability analysis in electron beam cell projection lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2793, Issue , 1996, Pages 230-240

  Itoh, Katsuyuki ^a   Yamashita, Hiroshi ^a   Ema, Takahiro ^a   Nozue, Hiroshi ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; ELECTROOPTICAL EFFECTS; MASKS; PHOTOMASKS; PHOTORESISTS; X RAYS;

DEFECT PRINTABILITY; ELECTRON BEAM CELL PROJECTION LITHOGRAPHIES; EXPOSURE DOSE; LINE PATTERN; LINE-AND-SPACE; MASK INSPECTION; RESIST PATTERN; WAFER SUBSTRATES;

DEFECTS;

EID: 4143066598     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.245201     Document Type: Conference Paper

References (8)

1. Y.Nakayama, S.Okazaki, N.Saitou and H.Wakabayashi, "Electron-beam cell projection lithography: A new high-throughput electron-beam direct writing technology using a specially tailored Si aperture, " J.Vac.Sci.Technol., B8 ' pp.1836-1840, 1990.
2. N.Saitou, S.Okazaki, T.Matsuzaka, Y.Nakayama and M. Okumura, "EB Cell Projection Lithography, " Proc. of 1990 Int.MicroProcess Conf., J.J.A.P. Series 4, pp-44-47, 1990.
3. H.Yasuda, K.Sakamoto, A.Yamada, and K.Kawashima, "Electron Beam Block Exposure, " J.J.A.P. Vol.30, No. 11 'pp.3098-3102, 1991.
4. Y.Sakitani, H.Yoda, H.Todokoro, YShibata, T.Yamasaki, K.Ohbitu, N.Saitou, S .Miriam, S .Okazaki, G.Matuoka, F.Mural, and M.Okumura, "Electron-beam cell-projection lithography system, " J.Vac.Sci.Technol., B 10(6), pp.2759-2763, 1992.
5. Y.Nakayama, N.Satoh, N.Saitou, S .Hirasawa, T. Yanagida and T. Todokoro, "Thermal Characteristics of Si Mask for EB Cell Projection Lithography, " Jpn.J.Appl. Phys.31, pp.323-327, 1992.
6. K.Hattori, R.Yoshikawa, H.Wada, H.Kusakabe, T.Yamaguchi, S.Magoshi, A.Miyagaki, S.Yamasaki and T.Takigawa, "Electron-beam direct writing system EX-8D employing character projection exposure method, " J.Vac.Sci.Technol., B 2(6), pp.2346-2351, 1993.
7. Y.Nakayama, Y.Sohda, N.Saitou and H.Itoh, "High accurate calibration method of electron beam cell projection lithography, " SPIE Vol. 1924, pp. 183-192, 1993.
8. H Satoh, Y Nakayama, N.Saitou and T. Kagami, "Silicon shaping mask for electron-beam cell projection lithography, " SPIE Vol.2254, pp-122-132, 1994.