Application of highly focused ion beams

Materials Science Forum

Volumn 248-249, Issue , 1997, Pages 445-450

  Bischoff, L ^a   Teichert, J ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

3D Structures; CoSi2; Etch Stop; Focused Ion Beam; Ion Milling; Ion Optics; Liquid Metal Ion Source; Writing Implantation

Indexed keywords

COBALT COMPOUNDS; CRYSTAL MICROSTRUCTURE; ETCHING; ION IMPLANTATION; LIQUID METALS; SILICON;

FOCUSED ION BEAM (FIB) SYSTEMS; LIQUID METAL ION SOURCE; WRITING IMPLANTATION;

ION BEAMS;

EID: 4143055868     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.248-249.445     Document Type: Article

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