Electron trapping by electric field reversal and Fermi mechanism

Physical Review E - Statistical, Nonlinear, and Soft Matter Physics

Volumn 70, Issue 5 2, 2004, Pages

  Pinheiro, Mário J ^a  

^a INSTITUTO SUPERIOR TÉCNICO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; ELECTRIC DISCHARGES; ELECTRON SCATTERING; ELECTRON TRAPS; PLASMAS; SPECTROSCOPY;

ELECTRIC FIELD REVERSALS; FERMI MECHANISM; OPERATIONAL PARAMETERS; POWER-LAW DISTRIBUTIONS;

ELECTRIC FIELDS;

EID: 41349089499     PISSN: 15393755     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevE.70.056409     Document Type: Article

References (29)

1. V. I. Kolobov and L. D. Tsendin, Phys. Rev. A 46, 7837 (1992).
2. R. A. Gottscho, A. Mitchell, G. R. Scheller, Y.-Y. Chan, and D. B. Graves, Phys. Rev. A 40, 6407 (1989).
3. D. Marió, K. Kutasi, G. Malović, Z. Donkó, and Z. Lj. Petrović, Eur. Phys. J. D 21, 73 (2002).
4. D. Marió, P. Hartmann, G. Malovié, Z. Donkó, and Z. Lj. Petrović, J. Phys. D 36, 2639 (2003).
5. V. I. Kolobov and V. A. Godyak, IEEE Trans. Plasma Sci. 23, 503 (1995), and references therein.
6. J. P. Boeuf and L. C. Pitchford, J. Phys. D 28, 2083 (1995).
7. J. Taillet, Am. J. Phys. 37, 423 (1969).
8. G. S. Harmon, Am. J. Phys. 44, 869 (1976).
9. A. Fiala, L. C. Pitchford, and J. P. Boeuf, Phys. Rev. E 49, 5607 (1994).
10. A. Bogaerts and R. Gijbels, J. Anal. At. Spectrom. 13, 721726 (1998); A. Bogaerts, A. Okhrimovskyy, and R. Gijbels, ibid. 17, 10761082 (2002).
11. A. Bogaerts and R. Gijbels, J. Anal. At. Spectrom. 13, 721726 (1998); A. Bogaerts, A. Okhrimovskyy, and R. Gijbels, ibid. 17, 10761082 (2002).
12. V. Kolobov and R. Arslanbekov, Microelectron. Eng. 69, 606615 (2003); A. Fedoseyev, V. Kolobov, R. Arslanbekov, and A. Przekwas, ibid 69, 577 (2003).
13. V. Kolobov and R. Arslanbekov, Microelectron. Eng. 69, 606615 (2003); A. Fedoseyev, V. Kolobov, R. Arslanbekov, and A. Przekwas, ibid 69, 577 (2003).
14. E. Fermi, Phys. Rev. 75, 1169 (1949).
15. E. A. Den Hartog, D. A. Doughty, and J. E. Lawler, Phys. Rev. A 38, 2471 (1988);
16. D. A. Doughty, E. A. Den Hartog, and J. E. Lawler, Phys. Rev. Lett. 58, 2668 (1987);
17. T. J. Sommerer, W. N. G. Hitchon, and J. E. Lawler, Phys. Rev. A 39, 6356 (1989);
18. M. Surendra, D. B. Graves, and G. M. Jellum, ibid. 41, 1112 (1990).
19. J. Bacri and C. Saint-Martin, Nuovo Cimento B 62, 81 (1969);
20. S. Vacquie, J. Bacri, D. Blanc, and F. Clavery, ibid 62 69 (1969).
21. K. Nishikawa and C.-S. Wu, Phys. Rev. Lett. 23, 1020 (1969).
22. P. Leung, A. Y. Wong, and B. H. Quon, Phys. Fluids 23, 992 (1980).
23. A. A. Kudryatsev and L. D. Tsendin, Tech. Phys. Lett. 27, 284 (2001).
24. M. M. Turner and M. B. Hopkins, Phys. Rev. Lett. 69, 3511 (1992).
25. U. Czametzki, D. Luggenhölscher, and H. F. Döbele, Plasma Sources Sci. Technol. 8, 230 (1999).
26. C. L. Longmire, Elementary Plasma, Physics (Wiley, New York, 1963), Sec. 3.7.
27. S. C. Brown, Basic Data of Plasma Physics (MIT Press, Cambridge, MA, 1959).
28. A. Shivarova, E. Tatarova, and V. Angelova, J. Phys. D 21, 1605 (1988).
29. M. J. Pinheiro and J. Loureiro, J. Phys. D 35, 3077 (2002).