Using polystyrene-co-maleic acid for molecularly imprinted membranes prepared in supercritical carbon dioxide

Journal of Applied Polymer Science

Volumn 108, Issue 2, 2008, Pages 757-768

  Kobayashi, Takaomi ^a   Leong, Su Si ^a   Zhang, Quanqiu ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Molecular imprinted membrane; Molecular recognition; Supercritical CO 2

Indexed keywords

BINDING ENERGY; CARBON DIOXIDE; MOLECULAR RECOGNITION; SUPERCRITICAL FLUIDS;

MOLECULAR IMPRINTED MEMBRANE; SUPERCRITICAL CARBON DIOXIDE;

POLYSTYRENES;

COPOLYMER; MEMBRANE; ORGANIC ACID; POLYSTYRENE; SOLVENT; SUPERCRITICAL CARBON DIOXIDE;

EID: 40949096506     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.27734     Document Type: Article

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