Charging studies using the CHARM2 wafer surface charging monitor

Nuclear Inst. and Methods in Physics Research, B

Volumn 74, Issue 1-2, 1993, Pages 301-305

  Lukaszek, W ^a   Dixon, W ^a   Quek, E ^a   Weisenberger, W ^b   Sung, Ho ^b  

^a STANFORD UNIVERSITY   (United States)

^b Ion Implant Services   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 40849131013     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(93)95065-D     Document Type: Article

References (7)

1. Ion beam induced wafer charging