Low temperature plasma channels generated in microcavity trenches with widths of 20-150 μm and aspect ratios as large as 104:1

Applied Physics Letters

Volumn 92, Issue 10, 2008, Pages

  Lu, M ^a   Park, S J ^a   Cunningham, B T ^a   Eden, J G ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CARRIER CONCENTRATION; CURRENT DENSITY; DIELECTRIC DEVICES; MICROCAVITIES; TEMPERATURE DISTRIBUTION;

DIELECTRIC BARRIER STRUCTURE; PLASMA REACTORS;

PLASMAS;

EID: 40849097933     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2827197     Document Type: Article

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