Anion effects on the electrochemical regeneration of Ce(IV) in nitric acid used for etching chromium

Journal of Hazardous Materials

Volumn 152, Issue 3, 2008, Pages 922-928

  Chen, Te San ^a   Yeh, Kuei Jyum C ^a   Huang, Kuo Lin ^a  

^a NATIONAL PINGTUNG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Anion effect; Cerium recovery; Cyclic voltammetry; Linear sweep voltammetry; Tafel slope

Indexed keywords

CERIUM; CYCLIC VOLTAMMETRY; ELECTROOXIDATION; NEGATIVE IONS; NITRIC ACID; REDOX REACTIONS;

ANION EFFECT; CERIUM RECOVERY; LINEAR SWEEP VOLTAMMETRY; TAFEL SLOPE;

METAL IONS;

ANION; CARBON; CERIUM; CHLORINE; CHROMIUM; NITRIC ACID; SULFURIC ACID;

CERIUM; CYCLIC VOLTAMMETRY; ELECTROOXIDATION; METAL IONS; NEGATIVE IONS; NITRIC ACID; REDOX REACTIONS;

ANION; CERIUM; CHROMIUM; ELECTROCHEMICAL METHOD; ETCHING; NITRIC ACID; OXIDATION;

ARTICLE; CYCLIC POTENTIOMETRY; ELECTROCHEMICAL ANALYSIS; OXIDATION REDUCTION REACTION;

ANIONS; CERIUM; CHROMIUM; ELECTROCHEMISTRY; NITRIC ACID; OXIDATION-REDUCTION;

EID: 40749139929     PISSN: 03043894     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2007.07.066     Document Type: Article

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