Free-standing SiO2 films containing Si nanocrystals directly suitable for transmission electron microscopy

Microelectronics Journal

Volumn 39, Issue 3-4, 2008, Pages 518-522

  Novikov, S ^a   Sinkkonen, J ^a   Nikitin, T ^b   Khriachtchev, L ^b   Rasanen M ^b   Haimi, E ^a  

^a AALTO UNIVERSITY   (Finland)

^b UNIVERSITY OF HELSINKI   (Finland)

Author keywords

Free standing film; Nanocrystal; Si SiO2

Indexed keywords

AMMONIUM COMPOUNDS; ANNEALING; NANOCRYSTALS; PHOTOLUMINESCENCE; RAMAN SPECTROSCOPY; SILICA; TRANSMISSION ELECTRON MICROSCOPY;

FREE-STANDING FILMS; LASER TREATMENT; REORGANIZATION; STRUCTURAL FILMS;

THIN FILMS;

EID: 40649115249     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2007.07.032     Document Type: Article

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