High-performance metal oxide nanowire chemical sensors with integrated micromachined hotplates

Applied Physics Letters

Volumn 92, Issue 9, 2008, Pages

  Ryu, Koungmin ^a   Zhang, Daihua ^a   Zhou, Chongwu ^a  

^a University of Southern California ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL SENSORS; ETHANOL; HYDROGEN; NANOSENSORS; SILICON NITRIDE;

DEVICE TEMPERATURE; INTEGRATED MICROMACHINED HOTPLATES; ROOM TEMPERATURE;

NANOWIRES;

EID: 40549142464     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2841665     Document Type: Article

References (18)

1. M. Law, H. Kind, B. Messer, F. Kim, and P. D. Yang, Angew. Chem., Int. Ed. ACIEF5 1433-7851 10.1002/1521-3773(20020703)41:13<2405::AID- ANIE2405>3.0.CO;2-3 41, 2405 (2002).
2. Z. Fan, D. Wang, P. Cheng, W. Tseng, and J. G. Lu, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1836870 85, 5923 (2004).
3. Q. H. Li, Y. X. Liang, Q. Wan, and T. H. Wang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1840116 85, 6389 (2004).
4. E. Comini, G. Faglia, G. Sberveglieri, Z. Pan, and Z. L. Wang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1504867 81, 1869 (2002).
5. A. Kolmakov, Y. X. Zhang, G. S. Cheng, and M. Moskovits, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/adma.200304889 15, 997 (2003).
6. V. V. Sysoev, B. K. Button, K. Wepsiec, S. Dmitriev, and A. Kolmakov, Nano Lett. NALEFD 1530-6984 10.1021/nl060185t 6, 1584 (2006).
7. D. Zhang, C. Li, X. Liu, S. Han, T. Tang, and C. Zhou, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1604194 83, 1845 (2003).
8. C. Li, D. Zhang, S. Han, X. Liu, and C. Zhou, J. Phys. Chem. B JPCBFK 1089-5647 10.1021/jp0361531 107, 12451 (2003).
9. J. Kong, N. R. Franklin, C. Zhou, M. G. Chapline, S. Peng, K. J. Cho, and H. Dai, Science SCIEAS 0036-8075 10.1126/science.287.5453.622 287, 622 (2000).
10. P. Qi, O. Vermesh, M. Grecu, A. Javey, Q. Wang, and H. Dai, Nano Lett. NALEFD 1530-6984 10.1021/nl034010k 3, 347 (2003).
11. J. Li, Y. Lu, M. Cinke, J. Han, and M. Meyyappan, Nano Lett. NALEFD 1530-6984 10.1021/nl034220x 3, 929 (2003).
12. C. Yu, Q. Hao, S. Saha, X. Kong, Z. L. Wang, and L. Shi, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1861133 86, 063101 (2005).
13. D. C. Meier, S. Semancik, B. Button, E. Strelcov, and A. Kolmakov, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2768861 91, 063118 (2007).
14. C. H. Mastrangelo, Y. Tai, and R. S. Muller, Sens. Actuators, A SAAPEB 0924-4247 10.1016/0924-4247(90)87046-L A21-A23, 856 (1990).
15. B. Lei, C. Li, D. Zhang, T. Tang, and C. Zhou, Appl. Phys. A: Mater. Sci. Process. APAMFC 0947-8396 10.1007/s00339-004-2707-x 79, 439 (2004).
16. S. Virji, J. Huang, R. B. Kaner, and B. R. Weiller, Nano Lett. NALEFD 1530-6984 10.1021/nl035122e 4, 491 (2004).
17. K. K. Makhija, A. Ray, R. M. Patel, U. B. Trivedi, and K. N. Kapse, Bull. Mater. Sci. BUMSDW 0250-4707 10.1007/BF02711165 28, 9 (2005).
18. Q. Wan, Q. H. Li, Y. J. Chen, and T. H. Wang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1738932 84, 3654 (2004).