-
1
-
-
0036772724
-
Vacuum packaging technology using localized aluminum/silicon-to-glass bonding
-
Oct
-
Y. Cheng, W. Hsu, K. Najafi, C. Nguyen, and L. Lin, "Vacuum packaging technology using localized aluminum/silicon-to-glass bonding," J. Microelectromech. Syst., vol. 11, no. 5, pp. 556-565, Oct. 2002.
-
(2002)
J. Microelectromech. Syst
, vol.11
, Issue.5
, pp. 556-565
-
-
Cheng, Y.1
Hsu, W.2
Najafi, K.3
Nguyen, C.4
Lin, L.5
-
2
-
-
0036384615
-
Hole drilling of glass-foam substrates with laser
-
Singapore
-
Y. Yoshida, H. Yajima, Y. Hashidate, H. Ogura, and S. Ueda, "Hole drilling of glass-foam substrates with laser," in Proc. 2nd Int. Symp. Laser Precision Microfabrication, Singapore, 2002, pp. 154-157.
-
(2002)
Proc. 2nd Int. Symp. Laser Precision Microfabrication
, pp. 154-157
-
-
Yoshida, Y.1
Yajima, H.2
Hashidate, Y.3
Ogura, H.4
Ueda, S.5
-
3
-
-
0028426115
-
Vacuum packaging for microsensors by glass-silicon anodic bonding
-
May
-
H. Henmi, S. Shoji, Y. Shoji, K. Yoshimi, and M. Esashi, "Vacuum packaging for microsensors by glass-silicon anodic bonding," Sens. Actuators A, Phys., vol. 43, no. 1-3, pp. 243-248, May 1994.
-
(1994)
Sens. Actuators A, Phys
, vol.43
, Issue.1-3
, pp. 243-248
-
-
Henmi, H.1
Shoji, S.2
Shoji, Y.3
Yoshimi, K.4
Esashi, M.5
-
4
-
-
0028430492
-
Fabrication and packaging of a resonant infrared sensor integrated in silicon
-
May
-
C. Cabuz, S. Shoji, K. Fukatsu, E. Cabuz, K. Minami, and M. Esashi, "Fabrication and packaging of a resonant infrared sensor integrated in silicon," Sens. Actuators A, Phys., vol. 43, no. 1-3, pp. 92-99, May 1994.
-
(1994)
Sens. Actuators A, Phys
, vol.43
, Issue.1-3
, pp. 92-99
-
-
Cabuz, C.1
Shoji, S.2
Fukatsu, K.3
Cabuz, E.4
Minami, K.5
Esashi, M.6
-
6
-
-
0034246439
-
High quality mechanical etching of brittle materials by powder blasting
-
Aug
-
P. Slikkerveer, P. Bouten, and F. de Haas, "High quality mechanical etching of brittle materials by powder blasting," Sens. Actuators A, Phys., vol. 85, no. 1-3, pp. 296-303, Aug. 2000.
-
(2000)
Sens. Actuators A, Phys
, vol.85
, Issue.1-3
, pp. 296-303
-
-
Slikkerveer, P.1
Bouten, P.2
de Haas, F.3
-
7
-
-
0038113524
-
A new fabrication method for low-pressure package with glass-silicon-glass structure and its stability
-
Sendai, Japan
-
T. Hara, S. Kobayashi, and K. Ohwada, "A new fabrication method for low-pressure package with glass-silicon-glass structure and its stability," in Proc. Int. Conf. Solid-State Sens. Actuators (TRANSDUCERS), Sendai, Japan, 1999, pp. 1316-1319.
-
(1999)
Proc. Int. Conf. Solid-State Sens. Actuators (TRANSDUCERS)
, pp. 1316-1319
-
-
Hara, T.1
Kobayashi, S.2
Ohwada, K.3
-
8
-
-
84944728850
-
Incrementally etched electrical feedthroughs for wafer-level transfer of glass lid packages
-
Boston, MA
-
J. Oberhammer and G. Stemme, "Incrementally etched electrical feedthroughs for wafer-level transfer of glass lid packages," in Proc. Int. Conf. Solid-State Sens. Actuators Conf. (TRANSDUCERS), Boston, MA, 2003, pp. 1832-1835.
-
(2003)
Proc. Int. Conf. Solid-State Sens. Actuators Conf. (TRANSDUCERS)
, pp. 1832-1835
-
-
Oberhammer, J.1
Stemme, G.2
-
9
-
-
0035016478
-
High density electrical feedthrough fabricated by deep reactive ion etching of Pyrex glass
-
Interlaken, Switzerland
-
X. Li, T. Abe, Y. Liu, and M. Esashi, "High density electrical feedthrough fabricated by deep reactive ion etching of Pyrex glass," in Proc. IEEE Int. Conf. MEMS, Interlaken, Switzerland, 2001, pp. 98-101.
-
(2001)
Proc. IEEE Int. Conf. MEMS
, pp. 98-101
-
-
Li, X.1
Abe, T.2
Liu, Y.3
Esashi, M.4
-
10
-
-
0035506511
-
Wafer-to-wafer bonding of nonplanarized MEMS surfaces using solder
-
Nov
-
D. Sparks, G. Queen, R. Weston, G. Woodward, M. Putty, L. Jordan, S. Zarabadi, and K. Jayakar, "Wafer-to-wafer bonding of nonplanarized MEMS surfaces using solder," J. Micromech. Microeng., vol. 11, no. 6, pp. 630-634, Nov. 2001.
-
(2001)
J. Micromech. Microeng
, vol.11
, Issue.6
, pp. 630-634
-
-
Sparks, D.1
Queen, G.2
Weston, R.3
Woodward, G.4
Putty, M.5
Jordan, L.6
Zarabadi, S.7
Jayakar, K.8
-
11
-
-
27544437585
-
Frequency stability of wafer-scale encapsulated MEMS resonators
-
Seoul, South Korea
-
B. Kim, R. Candler, M. Hopcroft, M. Agarwal, W. Park, and T. Kenny, "Frequency stability of wafer-scale encapsulated MEMS resonators," in Proc. Int. Conf. Solid-State Sens. Actuators Microsyst. (TRANSDUCERS) Seoul, South Korea, 2005, pp. 1965-1968.
-
(2005)
Proc. Int. Conf. Solid-State Sens. Actuators Microsyst. (TRANSDUCERS)
, pp. 1965-1968
-
-
Kim, B.1
Candler, R.2
Hopcroft, M.3
Agarwal, M.4
Park, W.5
Kenny, T.6
-
12
-
-
0038155575
-
A doubly anchored surface micromachined Pirani gauge for vacuum package characterization
-
Kyoto, Japan
-
B. Stark, Y Mei, C. Zhang, and K. Najafi, "A doubly anchored surface micromachined Pirani gauge for vacuum package characterization," in Proc. IEEE Int. Conf. MEMS, Kyoto, Japan, 2003, pp. 506-509.
-
(2003)
Proc. IEEE Int. Conf. MEMS
, pp. 506-509
-
-
Stark, B.1
Mei, Y.2
Zhang, C.3
Najafi, K.4
-
13
-
-
28444480711
-
A micromachined Pirani gauge with dual heat sinks
-
Nov
-
J. Chae, B. H. Stark, and K. Najafi, "A micromachined Pirani gauge with dual heat sinks," IEEE Trans. Adv. Packag., vol. 28, no. 4, pp. 619-625, Nov. 2005.
-
(2005)
IEEE Trans. Adv. Packag
, vol.28
, Issue.4
, pp. 619-625
-
-
Chae, J.1
Stark, B.H.2
Najafi, K.3
-
14
-
-
26844444276
-
A high-performance surface-micromachined Pirani gauge in SUMMIT V
-
Miami, FL
-
B. Stark, J. Chae, A. Kuo, A. Oliver, and K. Najafi, "A high-performance surface-micromachined Pirani gauge in SUMMIT V," in Proc. IEEE Int. Conf. MEMS, Miami, FL, 2005, pp. 295-298.
-
(2005)
Proc. IEEE Int. Conf. MEMS
, pp. 295-298
-
-
Stark, B.1
Chae, J.2
Kuo, A.3
Oliver, A.4
Najafi, K.5
-
15
-
-
26844532936
-
An improved performance poly Si Pirani vacuum gauge using heat distributing structural supports
-
J. Mitchell, G. R. Lahiji, and K. Najafi, "An improved performance poly Si Pirani vacuum gauge using heat distributing structural supports," in Proc. IEEE Int. Conf. MEMS, 2005, pp. 291-294.
-
(2005)
Proc. IEEE Int. Conf. MEMS
, pp. 291-294
-
-
Mitchell, J.1
Lahiji, G.R.2
Najafi, K.3
-
16
-
-
26844529375
-
Wafer-level vacuum package with vertical feedthroughs
-
Miami Beach, FL
-
J. Chae, J. M. Giachino, and K. Najafi, "Wafer-level vacuum package with vertical feedthroughs," in Proc. IEEE Int. Conf. MEMS, Miami Beach, FL, 2005, pp. 548-551.
-
(2005)
Proc. IEEE Int. Conf. MEMS
, pp. 548-551
-
-
Chae, J.1
Giachino, J.M.2
Najafi, K.3
-
17
-
-
0029547719
-
A CMOS dissolved wafer process for integrated p++ microelectromechanical systems
-
Stockholm, Sweden
-
Y. B. Gianchandani, K. J. Ma, and K. Najafi, "A CMOS dissolved wafer process for integrated p++ microelectromechanical systems," in Proc. Int. Conf. Solid-State Sens. Actuators Eurosensors (TRANSDUCERS , Stockholm, Sweden, 1995, pp. 79-82.
-
(1995)
Proc. Int. Conf. Solid-State Sens. Actuators Eurosensors (TRANSDUCERS
, pp. 79-82
-
-
Gianchandani, Y.B.1
Ma, K.J.2
Najafi, K.3
-
18
-
-
0029419213
-
A batch dissolved wafer process for low cost sensor applications
-
Austin, TX
-
S. T. Cho, "A batch dissolved wafer process for low cost sensor applications," in Proc. Int. Soc. Opt. Eng., Austin, TX, 1995, pp. 10-17.
-
(1995)
Proc. Int. Soc. Opt. Eng
, pp. 10-17
-
-
Cho, S.T.1
-
19
-
-
0026881397
-
A bulk silicon dissolved wafer process for microelectromechanical devices
-
Jun
-
Y. B. Gianchandani and K. Najafi, "A bulk silicon dissolved wafer process for microelectromechanical devices," J. Microelectromech. Syst., vol. 1 no.2,pp.77-85,Jun.1992.
-
(1992)
J. Microelectromech. Syst
, vol.1
, Issue.2
, pp. 77-85
-
-
Gianchandani, Y.B.1
Najafi, K.2
-
20
-
-
0031654019
-
A dissolved wafer process using a porous silicon sacrificial layer and a lightly-doped bulk silicon etch-stop
-
Heidelberg, Germany
-
T. E. Bell and K. D. Wise, "A dissolved wafer process using a porous silicon sacrificial layer and a lightly-doped bulk silicon etch-stop," in Proc. IEEE Int. Conf. MEMS, Heidelberg, Germany, 1998, pp. 251-256.
-
(1998)
Proc. IEEE Int. Conf. MEMS
, pp. 251-256
-
-
Bell, T.E.1
Wise, K.D.2
-
21
-
-
0010892707
-
Applications of high-performance MEMS pressure sensors based on dissolved wafer process
-
Baltimore, MD
-
S. Tadigadapa and S. M. Ansari, "Applications of high-performance MEMS pressure sensors based on dissolved wafer process," in Proc. SENSORS EXPO, Baltimore, MD, 1999, pp. 389-393.
-
(1999)
Proc. SENSORS EXPO
, pp. 389-393
-
-
Tadigadapa, S.1
Ansari, S.M.2
-
22
-
-
0030384697
-
Micromachining inertial instruments
-
Austin, TX
-
M. S. Weinberg, J. Bernstein, J. T. Borenstein, J. Campbell, J. Cousens, R. K. Cunningham, R. Fields, P. Greiff, B. Hugh, L. Niles, and J. B. Sohn, "Micromachining inertial instruments," in Proc. Micromachining Microfabrication Process Technol. II, Austin, TX, 1996, pp. 26-36.
-
(1996)
Proc. Micromachining Microfabrication Process Technol. II
, pp. 26-36
-
-
Weinberg, M.S.1
Bernstein, J.2
Borenstein, J.T.3
Campbell, J.4
Cousens, J.5
Cunningham, R.K.6
Fields, R.7
Greiff, P.8
Hugh, B.9
Niles, L.10
Sohn, J.B.11
-
23
-
-
4344594506
-
An in-plane high-sensitivity, low-noise micro-g silicon accelerometer with CMOS readout circuitry
-
Aug
-
J. Chae, H. Kulah, and K. Najafi, "An in-plane high-sensitivity, low-noise micro-g silicon accelerometer with CMOS readout circuitry," J. Microelectromech. Syst., vol. 13, no. 4, pp. 628-635, Aug. 2004.
-
(2004)
J. Microelectromech. Syst
, vol.13
, Issue.4
, pp. 628-635
-
-
Chae, J.1
Kulah, H.2
Najafi, K.3
-
24
-
-
18844395074
-
A monolithic three-axis micro-g micro-machined silicon capacitive accelerometer
-
Apr
-
J. Chae, H. Kulah, and K. Najafi, "A monolithic three-axis micro-g micro-machined silicon capacitive accelerometer," J. Microelectromech. Syst., vol. 14, no. 2, pp. 235-242, Apr. 2005.
-
(2005)
J. Microelectromech. Syst
, vol.14
, Issue.2
, pp. 235-242
-
-
Chae, J.1
Kulah, H.2
Najafi, K.3
-
25
-
-
14244258089
-
A CMOS-compatible high aspect ratio silicon-on-glass in-plane micro-accelerometer
-
Feb
-
J. Chae, H. Kulah, and K. Najafi, "A CMOS-compatible high aspect ratio silicon-on-glass in-plane micro-accelerometer," J. Micromech. Microeng., vol. 15, no. 2, pp. 336-345, Feb. 2005.
-
(2005)
J. Micromech. Microeng
, vol.15
, Issue.2
, pp. 336-345
-
-
Chae, J.1
Kulah, H.2
Najafi, K.3
-
26
-
-
0027286831
-
A micromachined comb-drive tuning fork rate gyroscope
-
Fort Lauderdale, FL
-
J. Bernstein, S. Cho, A. T. King, A. Kourepenis, P. Maciel, and M. Weinberg, "A micromachined comb-drive tuning fork rate gyroscope," in Proc. IEEE Int. Conf. MEMS, Fort Lauderdale, FL, 1993, pp. 143-148.
-
(1993)
Proc. IEEE Int. Conf. MEMS
, pp. 143-148
-
-
Bernstein, J.1
Cho, S.2
King, A.T.3
Kourepenis, A.4
Maciel, P.5
Weinberg, M.6
-
27
-
-
0030712718
-
Anodic bonding below 180 C for packaging and assembling of MEMS using lithium aluminosilicate beta-quartz glass-ceramic
-
Nagoya, Japan
-
S. Shoji, H. Kikuchi, and H. Torigoe, "Anodic bonding below 180 "C for packaging and assembling of MEMS using lithium aluminosilicate beta-quartz glass-ceramic," in Proc. IEEE Int. Conf. MEMS, Nagoya, Japan, 1997,pp.482-487.
-
(1997)
Proc. IEEE Int. Conf. MEMS
, pp. 482-487
-
-
Shoji, S.1
Kikuchi, H.2
Torigoe, H.3
-
28
-
-
0142258267
-
Chip-level vacuum packaging of micromachines using nanogetters
-
Aug
-
D. Sparks, N. Najafi, and S. Ansari, "Chip-level vacuum packaging of micromachines using nanogetters," IEEE Trans. Adv. Packag., vol. 26, no. 3, pp. 277-282, Aug. 2003.
-
(2003)
IEEE Trans. Adv. Packag
, vol.26
, Issue.3
, pp. 277-282
-
-
Sparks, D.1
Najafi, N.2
Ansari, S.3
-
29
-
-
0035439715
-
A hermetic glass-silicon package formed using localized aluminum/silicon-glass bonding
-
Sep
-
Y. Cheng, L. Lin, and K. Najafi, "A hermetic glass-silicon package formed using localized aluminum/silicon-glass bonding," J. Microelectromech. Syst., vol. 10, no. 3, pp. 392-399, Sep. 2001.
-
(2001)
J. Microelectromech. Syst
, vol.10
, Issue.3
, pp. 392-399
-
-
Cheng, Y.1
Lin, L.2
Najafi, K.3
|