Synthesis of alkaline-developable, photosensitive hyperbranched polyimides through the reaction of carboxylic acid dianhydrides and trisamines

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 42, Issue 15, 2004, Pages 3697-3707

  Makita, Shohei ^a,b   Kudo, Hiroto ^a   Nishikubo, Tadatomi ^a  

^a KANAGAWA UNIVERSITY   (Japan)

^b TAIYO INK MFG CO LTD   (Japan)

Author keywords

Alkaline developable photosensitive materials; Excellent thermal stability; High glass transition temperature; Hyperbranched polyimides; Hyperbranched polymers; Lithography; Photopolymerization; Radical polymerization

Indexed keywords

CARBOXYLIC ACIDS; CHEMICAL RESISTANCE; DIFFERENTIAL SCANNING CALORIMETRY; GLASS TRANSITION; LITHOGRAPHY; PHOTOPOLYMERIZATION; POLYIMIDES; SYNTHESIS (CHEMICAL); THERMODYNAMIC STABILITY; THERMOGRAVIMETRIC ANALYSIS; VISCOSITY;

ALKALINE-DEVELOPABLE PHOTOSENSITIVE MATERIALS; HYPERBRANCHED POLYIMIDES; HYPERBRANCHED POLYMERS; RADICAL POLYMERIZATION;

PHOTOSENSITIVITY;

EID: 4043153516     PISSN: 0887624X     EISSN: None     Source Type: Journal    
DOI: 10.1002/pola.20239     Document Type: Article

References (9)

1. Polyimides; Wilson, D.; Stenzenberger, H. D.; Hergenrother, P. M., Eds.; Blackie: London, 1990.
2. Kim, Y. H.; Webster, O. W. Macromolecules 1992, 25, 5561.
3. Jikei, M.; Chon, S. H.; Kakimoto, M.; Kawauchi, S.; Imase, T.; Watanabe, J. Macromolecules 1999, 32, 2061.
4. Young, H. K. J Polym Sci Part A: Polym Chem 1998, 36, 1685.
5. Okazaki, M.; Shibasaki, Y.; Ueda, M. Chem Lett 2001, 8, 762.
6. Makita, S.; Kudo, H.; Nishikubo, T. J Photopolym Sci Technol 2002, 15, 185.
7. Fang, J.; Kita, J.; Okamoto, K. Macromolecules 200, 33, 4639.
8. Nishikubo, T.; Imaura, M.; Mizuko, T.; Takaoka, T. J Appl Polym Sci 1974, 18, 3445.
9. Tsubata, A.; Uchiyama, T.; Kameyama, A.; Nishikubo, T. Macromolecules 1997, 30, 5649.