|
Volumn 1, Issue , 1996, Pages
|
The rate of radiative recombination in the nitride semiconductors and alloys
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ATOMIC FORCE MICROSCOPY;
CARRIER CONCENTRATION;
DECOMPOSITION;
ELECTRON CYCLOTRON RESONANCE;
ELECTRONIC PROPERTIES;
HALL EFFECT;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
MOLECULAR BEAM EPITAXY;
PASSIVATION;
SAPPHIRE;
STOICHIOMETRY;
SURFACE ROUGHNESS;
THIN FILMS;
X RAY DIFFRACTION ANALYSIS;
EXTRINSIC DEFECTS;
HALL MOBILITY;
PLASMA-ENHANCED MOLECULAR BEAM EPITAXY (PEMBE);
RADIO FREQUENCIES (RF);
GALLIUM NITRIDE;
|
EID: 4043128910
PISSN: 10925783
EISSN: None
Source Type: Journal
DOI: 10.1557/s1092578300002180 Document Type: Article |
Times cited : (7)
|
References (22)
|