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A Mach-Zehnder interferometer-based low-loss combiner
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IEEE Photon. Technol. Lett.
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van der Tol, J.J.G.M.1
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4043075963
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A pattern effect compensator
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Brussels, , Belgium, Dec. 3
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E. A. Patent, J. J. G. M. van der Tol, and N. Calabretta, "A pattern effect compensator," in Proc. 2001 Annu. Symp. IEEE/LEOS (Benelux Chapter), Brussels, , Belgium, Dec. 3, 2001, pp. 233-236.
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Patent, E.A.1
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3
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0001970377
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New 1 × 2 multi-mode interference couplers with free selection of power splitting ratios
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P. A. Besse, E. Gini, M. Bachmann, and H. Melchior, "New 1 × 2 multi-mode interference couplers with free selection of power splitting ratios," in ECOC'94, Florence, Sept. 25-29, 1994, pp. 669-672. paper We.C.2.4.
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Experimental assessment of access guide first-order mode effect on multimode interference couplers
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S-matrix oriented CAD tool for simulating complex integrated optical circuits
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General self-imaging propertiesn N x N multimode interference couplers including phase relations
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Overlapping-image multimode interference couplers with a reduced number of self-images for uniform and nonuniform power splitting
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M. Bachmann, P. A. Besse, and H. Melchior, "Overlapping-image multimode interference couplers with a reduced number of self-images for uniform and nonuniform power splitting," Appl. Opt., vol. 34, pp. 6898-6910, 1995.
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0027594982
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Film mode matching: A versatile numerical method for verctor mode field calculations in dielectric waveguides
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InP-based waveguides: Comparison of ECR plasma etching and wet-chemical etching
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Delft, The Netherlands, Oct
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J. J. G. M. van der Tol, M. Silova, F. Karouta, R. G. Broeke, H. H. Tan, C. Jagadish, E. Smalbrugge, and B. H. van Roy, "InP-based waveguides: Comparison of ECR plasma etching and wet-chemical etching," in Proc. IEEE/LEOS Symp. (Benelux Chapter), Delft, The Netherlands, Oct. 2000, pp. 127-130.
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van der Tol, J.J.G.M.1
Silova, M.2
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Jagadish, C.6
Smalbrugge, E.7
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