In vitro exposure systems for RF exposures at 900 MHz

IEEE Transactions on Microwave Theory and Techniques

Volumn 52, Issue 8 II, 2004, Pages 2067-2075

  Schilderet, Jürgen ^a   Spät, Denis ^b   Samaras, Theodoras ^b   Oesch, Walter ^a   Kuster, Niels ^a  

^a ETH ZURICH   (Switzerland)

^b ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

Author keywords

Dosimetry; Exposure setup; RF; Specific absorption rate (SAR)

Indexed keywords

CELLS; DIELECTRIC PROPERTIES; DOSIMETRY; ENERGY EFFICIENCY; FREQUENCIES; LIGHT ABSORPTION; MONOLAYERS; POLARIZATION;

CELL SUSPENSIONS; EXPOSURE SETUP; RF; SPECIFIC ABSORPTION RATE (SAR);

OPTICAL WAVEGUIDES;

EID: 4043085492     PISSN: 00189480     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMTT.2004.832010     Document Type: Article

References (16)

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