Asymmetric crack wake plasticity - A reason for roughness induced crack closure

Acta Materialia

Volumn 52, Issue 15, 2004, Pages 4493-4502

  Pippan, R ^a,b   Strobl, G ^a   Kreuzer, H ^a   Motz, C ^a  

^a ERICH SCHMID INSTITUTE OF MATERIALS SCIENCE   (Austria)

^b INSTITUTE FOR MICROELECTRONICS   (Austria)

Author keywords

Electron backscattering diffraction; Fatigue crack propagation; Roughness induced crack closure

Indexed keywords

ANISOTROPY; BACKSCATTERING; COMPUTATIONAL GEOMETRY; CONTINUUM MECHANICS; CRYSTAL ORIENTATION; ELECTRONS; MICROSTRUCTURE; PLASTIC DEFORMATION; PLASTICITY; SURFACE ROUGHNESS;

ELECTRON BACK SCATTERING DIFFRACTION; FATIGUE CRACK PROPAGATION; PLASTIC DISPLACEMENT; ROUGHNESS INDUCED CRACK CLOSURE;

CRACK PROPAGATION;

EID: 4043055801     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2004.06.014     Document Type: Article

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