Advanced electrochemical processes for sub-50nm on-chip metallization

ECS Transactions

Volumn 2, Issue 6, 2006, Pages 13-18

  Akolkar, Rohan ^a   Cheng, Chin Chang ^a   Chebiam, Ramanan ^a   Fajardo, Arnel ^a   Dubin, Valery ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMISTRY; ELECTROLESS PLATING; ELECTROMIGRATION; ELECTROPLATING; METALLIZING;

COPPER INTERCONNECTS; ELECTROMIGRATION RESISTANCE; ON-CHIP METALLIZATION; POTENTIAL SOLUTION;

MICROPROCESSOR CHIPS;

EID: 40249084702     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2408859     Document Type: Conference Paper

References (16)