Surface characterization of chromium oxide thin films in dependence on CVD growth process parameters

ECS Transactions

Volumn 2, Issue 7, 2006, Pages 229-236

  Ivanova, T ^a   Gesheva, K A ^a   Szekeres, A ^b   Trofimov, O ^c  

^a Central Laboratory of Solar Energy and New Energy Sources   (Bulgaria)

^b INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

^c INSTITUTE OF MICROELECTRONICS TECHNOLOGY AND HIGH PURITY MATERIALS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CHROMIUM COMPOUNDS; GROWTH RATE; INTERCALATION COMPOUNDS; SUBSTRATES; SURFACE CHEMISTRY;

CHROMIUM OXIDE; DEPOSITION TEMPERATURE; GROWTH PROCESS PARAMETERS; SURFACE CHARACTERIZATION;

THIN FILMS;

EID: 40249084688     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2408917     Document Type: Conference Paper

References (20)