Comparison of Ni-Cu alloy films electrodeposited at low and high pH levels

Journal of Alloys and Compounds

Volumn 453, Issue 1-2, 2008, Pages 15-19

  Alper, Mürsel ^a   Kockar, Hakan ^b   Safak, Mürside ^a   Baykul, M Celalettin ^c  

^a ULUDAG UNIVERSITY   (Turkey)

^b BALIKESIR UNIVERSITY   (Turkey)

^c ESKISEHIR OSMANGAZI UNIVERSITY   (Turkey)

Author keywords

Electrodeposition; Magnetoresistance; Ni Cu films; SEM; XRD

Indexed keywords

ELECTRODEPOSITION; MAGNETORESISTANCE; NICKEL ALLOYS; PH EFFECTS; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

CRYSTAL PLANES; CRYSTAL TEXTURE; FACE-CENTRED CUBIC (FCC); VIBRATING SAMPLE MAGNETOMETER (VSM);

THIN FILMS;

EID: 40149100946     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2006.11.066     Document Type: Article

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