Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes

Lab on a Chip

Volumn 8, Issue 3, 2008, Pages 402-407

  Sparreboom, Wouter ^a   Eijkel, Jan C T ^a   Bomer, Johan ^a   Van Den Berg, Albert ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; NANOCHANNEL;

ARTICLE; CHEMICAL REACTION KINETICS; ELECTROCHEMICAL ANALYSIS; ELECTRODE; POLARIZATION; PRIORITY JOURNAL; SOLUBILITY;

EID: 40049104721     PISSN: 14730197     EISSN: 14730189     Source Type: Journal    
DOI: 10.1039/b716382g     Document Type: Article

References (19)