Electrochemical properties of LiCoO2 thin film electrode prepared by ink-jet printing technique

Thin Solid Films

Volumn 516, Issue 10, 2008, Pages 3314-3319

  Huang, Junjie ^a   Yang, Jianjun ^a   Li, Wenrong ^a   Cai, Wenbin ^a   Jiang, Zhiyu ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

Ink jet printing; LiCoO2; Nano material; Thin film

Indexed keywords

ELECTRODES; NANOSTRUCTURED MATERIALS; SOL-GEL PROCESS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

DISCHARGE CYCLING; INK-JET PRINTING;

INK;

EID: 39649105678     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.09.039     Document Type: Article

References (32)

1. Schwenzel J., Thangadurai V., and Weppner W. J. Power Sources 154 (2006) 232
2. Xia H., Lu L., and Ceder G. J. Alloys Compd. 417 (2006) 304
3. Nobili F., Dsoke S., Minicucci M., Croce F., and Marassi R. J. Phys. Chem. B 110 (2006) 11310
4. Nishizawa M., Uchiyama T., Itoh T., Abe T., and Uchida I. Langmuir 15 (1999) 4949
5. Moon H., and Park J. J. Power Sources 119/121 (2003) 717
6. Michalak F., von Rottkay K., Richardson T., Slack J., and Rubin M. Electrochim. Acta 44 (1999) 3085
7. Yoshimura M., Han K.S., and Tsurimoto S. Solid State Ionics 106 (1998) 39
8. Choi W.G., and Yoon S.G. J. Power Sources 125 (2004) 236
9. Liu P., Lee S.H., Tracy C.E., and Turner J.A. J. Power Sources 119-121 (2003) 305
10. Matsushita T., Dokko K., and Kanamura K. J. Electrochem. Soc. 152 (2005) A2229
11. Rho Y.H., and Kanamura K. J. Electrochem. Soc. 151 (2004) A1406
12. Perkins J.D., Bahn C.S., Mcgraw J.M., Parilla P.A., and Ginley D.S. J. Electrochem. Soc. 148 (2001) A1302
13. Bouwman P.J., Boukamp B.A., Bouwmeester H.J.M., Wondergem H.J., and Notten P.H.L. J. Electrochem. Soc. 148 (2001) A311
14. Kim W.S. J. Power Sources 134 (2004) 103
15. Liao C.L., Wu M.T., Yen J.H., Leu I.C., and Fung K.Z. J. Alloys Compd. 414 (2006) 302
16. Maranchi J.P., Hepp A.F., and Kumta P.N. Mater. Sci. Eng., B 116 (2005) 327
17. Yu Y., Shui J.L., Jin Y., and Chen C.H. Electrochim. Acta. 51 (2006) 3292
18. Yoon W.S., Ban S.H., Lee K.K., Kim K.B., Kim M.G., and Lee J.M. J. Power Sources 97-98 (2001) 282
19. Sirringhaus H., Kawase T., Friend R.H., Shimoda T., Inbasekaran M., Wu W., and Woo E.P. Science 290 (2000) 2123 (Washington, DC, U.S.)
20. Blazdell P.F., and Evans J.R.G. J. Mater. Process. Technol. 99 (2000) 94
21. MacBeath G., Schreiber, and Stuart L. Science 289 (2000) 1760 (Washington, DC, U.S.)
22. Hebner T.R., Wu C.C., Marcy D., Lu M.H., and Sturm J.C. Appl. Phys. Lett. 72 (1998) 519
23. Pede D., Serra G., and De Rossi D. Mater. Sci. Eng., C 5 (1998) 289
24. Xu F., Wang T., Li W., and Jiang Z. Chem. Phys. Lett. 375 (2003) 247
25. Zhao Y., Zhou Q., Liu L., Xu J., Yan M., and Jiang Z. Electrochim. Acta. 51 (2006) 2639
26. Song S.W., Han K.S., and Yoshimura M. J. Am. Ceram. Soc. 83 (2000) 2839
27. Powder Diffraction File. Card No. 16-0427, Joint Committee on Powder Diffraction Standards (JCPDS) (1991) Swarthmore, PA, USA
28. Kim Y.J., Kim H., Kim B., Ahn D., Lee J., Kim T., et al. Chem. Mater. 15 (2003) 1505
29. Inaba M., Iriyama Y., Ogumi Z., Todzuka Y., and Tasaka A. J. Raman Spectrosc. 28 (1997) 613
30. Kim M.K., Chung H.T., Park Y.J., Kim J.G., Son J.T., Park K.S., and Kim H.G. J. Power Sources 99 (2001) 34
31. Uchida I., and Sato H. J. Electrochem. Soc. 142 (1995) L139
32. Dokko K., Mohamedi M., Fujita Y., Itoh T., Nishizawa M., Umeda M., and Uchida I. J. Electrochem. Soc. 148 (2001) A422