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Volumn 92, Issue 6, 2008, Pages

Formation of stable direct current microhollow cathode discharge by venturi gas flow system for remote plasma source in atmosphere

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ELECTRIC DISCHARGES; PLASMA SOURCES;

EID: 39349108553     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2842427     Document Type: Article
Times cited : (4)

References (15)
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  • 2
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    • EDLEDZ 0741-3106 10.1109/55.678538.
    • K. C. Choi, IEEE Electron Device Lett. EDLEDZ 0741-3106 10.1109/55.678538 19, 186 (1998).
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    • Choi, K.C.1
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    • 0347221097 scopus 로고    scopus 로고
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    • R. M. Sankaran and K. P. Giapis, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1497719 92, 2406 (2002).
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    • Sankaran, R.M.1    Giapis, K.P.2
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    • 0017513005 scopus 로고
    • JJAPA5 0021-4922 10.1143/JJAP.16.1081.
    • K. Fujii, Jpn. J. Appl. Phys. JJAPA5 0021-4922 10.1143/JJAP.16.1081 16, 1081 (1977).
    • (1977) Jpn. J. Appl. Phys. , vol.16 , pp. 1081
    • Fujii, K.1
  • 7
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    • JPAPBE 0022-3727 10.1088/0022-3727/10/3/010.
    • P. Gill and C. E. Webb, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/10/ 3/010 10, 299 (1977).
    • (1977) J. Phys. D , vol.10 , pp. 299
    • Gill, P.1    Webb, C.E.2
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    • 0035308043 scopus 로고    scopus 로고
    • JAPIAU 0021-8979 10.1063/1.1351546.
    • R. H. Stark and K. H. Schoenbach, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1351546 89, 3568 (2001).
    • (2001) J. Appl. Phys. , vol.89 , pp. 3568
    • Stark, R.H.1    Schoenbach, K.H.2
  • 12
  • 13
    • 39349086139 scopus 로고
    • Fluid Mechanics for Chemical Engineers (McGraw-Hill, New York),.
    • N. Nevers, Fluid Mechanics for Chemical Engineers (McGraw-Hill, New York, 1991), p. 147.
    • (1991) , pp. 147
    • Nevers, N.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.