-
2
-
-
0032096911
-
-
EDLEDZ 0741-3106 10.1109/55.678538.
-
K. C. Choi, IEEE Electron Device Lett. EDLEDZ 0741-3106 10.1109/55.678538 19, 186 (1998).
-
(1998)
IEEE Electron Device Lett.
, vol.19
, pp. 186
-
-
Choi, K.C.1
-
4
-
-
81255166186
-
-
PHPAEN 1070-664X 10.1063/1.874039.
-
K. H. Schoenbach, A. El-Habachi, M. M. Moselhy, W. Shi, and R. H. Stark, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.874039 7, 2186 (2000).
-
(2000)
Phys. Plasmas
, vol.7
, pp. 2186
-
-
Schoenbach, K.H.1
El-Habachi, A.2
Moselhy, M.M.3
Shi, W.4
Stark, R.H.5
-
5
-
-
0347221097
-
-
JAPIAU 0021-8979 10.1063/1.1497719.
-
R. M. Sankaran and K. P. Giapis, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1497719 92, 2406 (2002).
-
(2002)
J. Appl. Phys.
, vol.92
, pp. 2406
-
-
Sankaran, R.M.1
Giapis, K.P.2
-
6
-
-
0017513005
-
-
JJAPA5 0021-4922 10.1143/JJAP.16.1081.
-
K. Fujii, Jpn. J. Appl. Phys. JJAPA5 0021-4922 10.1143/JJAP.16.1081 16, 1081 (1977).
-
(1977)
Jpn. J. Appl. Phys.
, vol.16
, pp. 1081
-
-
Fujii, K.1
-
7
-
-
0017453667
-
-
JPAPBE 0022-3727 10.1088/0022-3727/10/3/010.
-
P. Gill and C. E. Webb, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/10/ 3/010 10, 299 (1977).
-
(1977)
J. Phys. D
, vol.10
, pp. 299
-
-
Gill, P.1
Webb, C.E.2
-
9
-
-
81255166186
-
-
PHPAEN 1070-664X 10.1063/1.874039.
-
K. H. Schoenbach, A. El-Habachi, M. M. Moselhy, W. Shi, and R. H. Stark, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.874039 7, 2186 (2000).
-
(2000)
Phys. Plasmas
, vol.7
, pp. 2186
-
-
Schoenbach, K.H.1
El-Habachi, A.2
Moselhy, M.M.3
Shi, W.4
Stark, R.H.5
-
10
-
-
0036862059
-
-
PSTEEU 0963-0252 10.1088/0963-0252/11/4/314.
-
C. Penache, M. Miclea, A. Brauning-Demian, O. Hahn, S. Schossler, T. Jahnke, K. Niemax, and H. Schmidt-Bocking, Plasma Sources Sci. Technol. PSTEEU 0963-0252 10.1088/0963-0252/11/4/314 11, 476 (2002).
-
(2002)
Plasma Sources Sci. Technol.
, vol.11
, pp. 476
-
-
Penache, C.1
Miclea, M.2
Brauning-Demian, A.3
Hahn, O.4
Schossler, S.5
Jahnke, T.6
Niemax, K.7
Schmidt-Bocking, H.8
-
11
-
-
0035308043
-
-
JAPIAU 0021-8979 10.1063/1.1351546.
-
R. H. Stark and K. H. Schoenbach, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1351546 89, 3568 (2001).
-
(2001)
J. Appl. Phys.
, vol.89
, pp. 3568
-
-
Stark, R.H.1
Schoenbach, K.H.2
-
13
-
-
39349086139
-
-
Fluid Mechanics for Chemical Engineers (McGraw-Hill, New York),.
-
N. Nevers, Fluid Mechanics for Chemical Engineers (McGraw-Hill, New York, 1991), p. 147.
-
(1991)
, pp. 147
-
-
Nevers, N.1
-
14
-
-
0031276277
-
-
PSTEEU 0963-0252 10.1088/0963-0252/6/4/003.
-
K. H. Schoenbach, A. El-Habachi, W. Shi, and M. Ciocca, Plasma Sources Sci. Technol. PSTEEU 0963-0252 10.1088/0963-0252/6/4/003 6, 468 (1997).
-
(1997)
Plasma Sources Sci. Technol.
, vol.6
, pp. 468
-
-
Schoenbach, K.H.1
El-Habachi, A.2
Shi, W.3
Ciocca, M.4
-
15
-
-
27544481787
-
-
JPAPBE 0022-3727 10.1088/0022-3727/38/21/010.
-
P. Paris, M. Aints, F. Valk, T. Plank, A. Haljaste, K. V. Kozlov, and H.-E. Wagner, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/38/21/010 38, 3894 (2005).
-
(2005)
J. Phys. D
, vol.38
, pp. 3894
-
-
Paris, P.1
Aints, M.2
Valk, F.3
Plank, T.4
Haljaste, A.5
Kozlov, K.V.6
Wagner, H.-E.7
|