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Volumn 452, Issue 2, 2008, Pages 446-450
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The application of the in situ high-temperature X-ray diffraction quantitative analysis
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Author keywords
High temperature X ray diffraction; Oxide materials; Quenching
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Indexed keywords
HIGH TEMPERATURE EFFECTS;
QUENCHING;
TERNARY SYSTEMS;
THERMAL DIFFUSION;
X RAY DIFFRACTION ANALYSIS;
HIGH-TEMPERATURE X-RAY DIFFRACTION;
OXIDE MATERIALS;
COPPER COMPOUNDS;
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EID: 39049122247
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2007.03.012 Document Type: Article |
Times cited : (6)
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References (16)
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