메뉴 건너뛰기




Volumn 452, Issue 2, 2008, Pages 446-450

The application of the in situ high-temperature X-ray diffraction quantitative analysis

Author keywords

High temperature X ray diffraction; Oxide materials; Quenching

Indexed keywords

HIGH TEMPERATURE EFFECTS; QUENCHING; TERNARY SYSTEMS; THERMAL DIFFUSION; X RAY DIFFRACTION ANALYSIS;

EID: 39049122247     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2007.03.012     Document Type: Article
Times cited : (6)

References (16)
  • 12
    • 39049086194 scopus 로고    scopus 로고
    • A.C. Larson, R.B. Von Dreele, Los Alamos National Laboratory Report No. LA-UR-86-784, 2000.
    • A.C. Larson, R.B. Von Dreele, Los Alamos National Laboratory Report No. LA-UR-86-784, 2000.
  • 16
    • 0020779131 scopus 로고
    • Zhao M.Y. CALPHAD 7 (1983) 185-199
    • (1983) CALPHAD , vol.7 , pp. 185-199
    • Zhao, M.Y.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.