The photosensitive properties of polysiloxane acrylate resin containing tertiary amine groups

Journal of Applied Polymer Science

Volumn 107, Issue 5, 2008, Pages 2944-2948

  Sun, Fang ^a   Jiang, Sheng Ling ^a   Du, Hong Guang ^a  

^a BEIJING UNIVERSITY OF CHEMICAL TECHNOLOGY   (China)

Author keywords

diaminopolysiloxane (ANS); Di (N,N diacrylolyl) ; ESR; Photopolymerization; Sensitization; Spin trap

Indexed keywords

AMINES; PHOTOPOLYMERIZATION; PHOTOSENSITIVITY; SILICONES;

SENSITIZATION; SPIN TRAP;

RESINS;

CURING (CHEMISTRY); OLIGOMER; POLYACRYLATE; POLYAMINE; POLYSILOXANE; RESIN; ULTRAVIOLET RADIATION;

EID: 39049112107     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.27492     Document Type: Article

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